Monitoring Software / Facility Monitoring
For contamination control in critical process environments such as cleanrooms, isolators, and RABS, the use of multiple stationary particle counters or microbial air samplers is recommended. The measurement data is output through a central Facility Monitoring Software (EMC). Continuous monitoring of critical process parameters allows for the observation of trends and immediate response to exceedances of predefined alarm thresholds. Direct intervention upon an alarm enables a quick response, leading to the reduction of defective products and thus lowering costs. The monitoring system typically consists of three separate components. The monitor collects the recorded data, which is simultaneously accessed on the client PC. Data is stored on a server in an SQL database. As a fourth component, an OPC UA server enables bidirectional communication with other systems. Additionally, it is possible to mirror the monitor and database to ensure continuous data backup in case of a component failure. Due to its modular design, EMC is also compatible with environmental sensors and alarm units using TCP/IP Ethernet protocols, Power over Ethernet connectivity, Modbus protocols, OPC connections, and 4-20 mA analog interfaces.
• Integration of all airborne particle counters and microbial air samplers
• Additional monitoring of parameters such as temperature, differential pressure, humidity, and alarm conditions
• User-friendly interface
• Integration of building floor plans possible
• Creation of charts and customized reports
• Compliance with 21 CFR Part 11